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Oxidation Presentation Transcript
1.UNIT PROCESS OXIDATION
2.Oxidation, Diffusion & Ion Implantation Oxidation, Growth mechanism and Deal-Grove Model of oxidation, Linear and Parabolic Rate co-efficient, Structure of SiO2, Oxidation techniques and system, Oxide properties. Ficks diffusion Equation in One Dimension, Atomic model, Analytic Solution of Ficks Law, correction to simple theory , Diffusion in SiO2. Ion Implantation and Ion Implantation Systems.
3.Lecture Plan Applications of Silicon Oxide in VLSI fabrication Growth Techniques and process steps Growth Mechanism and Kinetics Characterization and measurements
4.Oxide Applications
5.Oxide Applications – Native Oxide
6.Oxide Applications – Field Oxide
7.Oxide Applications – Gate Oxide
8.Oxide Applications – Diffusion Mask
9.Oxide Applications – Ion Implant Barrier 10.Oxide Applications – Screen Oxide for Ion Implant Barrier (contd.)
11.Oxide Applications – Screen Oxide for Ion Implant Barrier 12.Oxide Applications – Pad Oxide
13.Oxide Applications – Pad and barrier in STI (Shallow Trench Isolation) 14.Oxide Applications – Insulating barrier between Metal Layers
15.Oxide Applications – Blanket Field Oxide
16.Oxide Applications – Sacrificial and gate Oxiation
17.Summary - uses of Oxide Film Impurity-mask barrier during doping Device scratch protection and contamination isolation Surface passivation - field isolation to confine charged carriers Dielectric material in gate oxide Dielectric layer between metal conductor layers
18.Oxide Thickness Measurement
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